Characterization of Initial Low-Aspect Ratio RFP Plasmas in “RELAX”

Sadao Masamune; Akio Sanpei; Ryuya Ikezoe; Takumi Onchi; Ken-Ichi Murata; Kensuke Oki; Hiroyuki Shimazu; Tetsuo Yamashita; Haruhiko Himura

doi:10.1143/jpsj.76.123501

Sadao Masamune, Akio Sanpei, Ryuya Ikezoe, Takumi Onchi, Ken-Ichi Murata, Kensuke Oki, Hiroyuki Shimazu, Tetsuo Yamashita, Haruhiko Himura

著者情報

Sadao Masamune
Department of Electronics, Kyoto Institute of Technology
Akio Sanpei
Department of Electronics, Kyoto Institute of Technology
Ryuya Ikezoe
Department of Electronics, Kyoto Institute of Technology
Takumi Onchi
Department of Electronics, Kyoto Institute of Technology
Ken-Ichi Murata
Department of Electronics, Kyoto Institute of Technology
Kensuke Oki
Department of Electronics, Kyoto Institute of Technology
Hiroyuki Shimazu
Department of Electronics, Kyoto Institute of Technology
Tetsuo Yamashita
Department of Electronics, Kyoto Institute of Technology
Haruhiko Himura
Department of Electronics, Kyoto Institute of Technology

キーワード: reversed field pinch (RFP), low-aspect ratio, relaxation, dynamo, nonlinear MHD

ジャーナル認証あり

2007 年 76 巻 12 号 p. 123501

DOI https://doi.org/10.1143/jpsj.76.123501

詳細

抄録

A reversed field pinch (RFP) machine with aspect ratio of as low as 2 (R⁄a=0.51 m/0.25 m) has been constructed for the experimental study of new RFP regime. Low-aspect ratio RFP plasmas have been produced in a resistive wall vacuum vessel for the first time. Initial results on discharge characteristics of the low-A RFP plasmas are presented. This experiment serves our study on new RFP regime with expected characteristics of simpler MHD dynamic arising from equilibrium profiles with less densely spaced rational surfaces of the dominant modes, which have been revealed by the recent progress in RFP research.

責任著者(Corresponding author)

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