Abstract
Adsorption of hydrogen on nickel film was measured, which was evaporated under an ultra-high vacuum condition. The relation between the adsorption and the change of electrical resistance of the film was closely studied to find apparently complicated results, which were very different from those of the previous reports. The effect of film thickness, measuring temperature and annealing temperature were separately examined. Adsorption kinetics were also regarded. From the experimental facts it was concluded that the adsorbed species were: (1) negatively charged atom, (2) positively charged atom and (3) molecule. The charge is, however, relatively small. An explanation for the resistance change was suggested.