抄録
An expression for the Hall coefficient R is obtained using a variational calculation on the assumption that two kinds of scattering processes exist for the conduction electrons. The relation of the Hall coefficient to resistivities due to individual scattering processes is generally discussed. Temperature dependence of R in monovalent metals and their dilute alloys are interpreted from anisotropy of the relaxation times associated with different scattering mechanisms. The maximum of |R| vs temperature curve in monovalent metals is explained assuming that the umklapp process is more anisotropic than the normal process in the scattering of electrons by phonons.
