Frequency Dependence of H.F. Plugging of a Plasma

抄録

It is found that there are two optimum frequencies for the H.F. plugging of a mirro confined plasma. By observing the frequency shift caused by the capacitance externally added to the high frequency electrodes, the lower frequency is confirmed to be a series resonance. The higher frequency, which is not changed by the capacitance, can be explained by a parallel resonance due to the plasma resonance. Such capacitive coupling processes will the sufficient to explain the previously observed results which have been attributed to an ion cyclotron wave excited by the applied H.F. frequency voltage.