Cross-section Observation of Inorganic/Organic Materials by Using FIB-TOF-SIMS

Abstract

The applications of depth profile analyses in TOF-SIMS are expanding, because TOF-SIMS has high sensitivity for elemental as well as molecular species. Sputter depth profiling is commonly used to obtain depth profiles. However, if the sample has a complex structure or composition, the result will be quite difficult to understand. The authors have tried the cross-section imaging methods to know the accurate elemental or molecular depth distributions for such kinds of samples. In this article, in order to acquire the cross-section images from organic/inorganic hybrid materials by using FIB-TOF-SIMS, the possibility of removal of FIB induced damage layer by Ar-GCIB was investigated. The author applied this result to the organic/inorganic multilayer sample analysis, and it was shown that the cross-section imaging of an organic material underneath the metal layer was possible.