Abstract
X-ray Photoelectron Spectroscopy (XPS) is one of the tools for direct observation of surface chemical states. The environmental condition around sample need to be an ultra high vacuum condition in order to avoid discharge of analyzer and contamination on detector during conventional XPS measurements. Intensity drop due to interaction between photoelectron, X-ray and gaseous molecules makes it difficult to perform measurements in gaseous condition. Increase of request on measurement with gaseous condition promote development for new XPS technique recently. Frontier technique of XPS that enable to perform XPS at near ambient pressure condition and several results are revealed in this article.
