[volume title in Japanese]
Conference information
Host: The Japan Society of Applied Physics
Name : [in Japanese]
Number : 65
Location : [in Japanese]
Date : September 01, 2004 - September 04, 2004
[title in Japanese]
Keywords:
Thin Films・Surfaces,
Beam Technologies,
Semiconductors A (Silicon),
Amorphous Materials,
Fundamental Science of Plasma CVD and Its Application,
Physics and Applications of Carbon Nanotubes,
Plasma Etching, Basics and Application for Devices,
Zinc Oxide and Related Functional Materials
Pages 659-876
Details
Article 1st page
