Study of etching process using CHF3 gas condensed layer in cryogenic region
Released on J-STAGE: May 26, 2022 |
The 67th JSAP Spring Meeting 2020
12p-A205-6
* Masahiro Hazumi, Suganthamalar Selvaraj, Hsiao Shih-Nan, Sekine Makoto, Hayashi Hisataka, Sasaki Toshiyuki, Abe Chihiro, Tsutsumi Takayoshi, Ishikawa Kenji, Hori Masaru