[volume title in Japanese]
Session ID : 13p-E1-18
Conference information
Host: The Japan Society of Applied Physics
Name : [in Japanese]
Number : 73
Location : [in Japanese]
Date : September 11, 2012 - September 14, 2012
Study on reaction mechanism of plasma-enhanced atomic layer deposition of SiO2 using in-situ ATR-FTIR
*Yi Lu, Akiko Kobayashi, Youn Joon Kim, Kenji Ishikawa, Hiroki Kondo, Makoto Sekine, Masaru Hori
Author information
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