The 61st JSAP Spring Meeting 2014
Session ID : 19p-E14-18
Conference information
Host: The Japan Society of Applied Physics
Name : JSAP Spring Meeting
Number : 61
Location : [in Japanese]
Date : March 17, 2014 - March 20, 2014
Polish uniformity for Si and SiO2 using a minimal CMP machine
*Norio Umeyama, Kazutaka Shibuya, Yoshio Nakamura, Kouichiro Ichikawa, Sommawan Khumpuang, Shiro Hara
Author information
Keywords:
19p-E14-18
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