The 62nd JSAP Spring Meeting 2015
Session ID : 12a-A27-2
Conference information
Host: The Japan Society of Applied Physics
Name : JSAP Spring Meeting
Number : 62
Location : [in Japanese]
Date : March 11, 2015 - March 14, 2015
Surface reaction during the slow Si etching using F2 and NO2
Keywords:
12a-A27-2,
Chemical dry etching
Details
Article 1st page
