The 76th JSAP Autumn Meeting 2015
Session ID : 14p-1A-1
Conference information
Host: The Japan Society of Applied Physics
Name : JSAP Autumn Meeting
Number : 76
Location : [in Japanese]
Date : September 13, 2015 - September 16, 2015
Reusable Colloidal-based Polymer Photomask for Rapid Nanoscale Patterning
Keywords:
14p-1A-1,
International Symposium on Thin Film Technologies for Flexible Devices,
colloidal monolayer,
wafer scale nanopatterning,
soft photomask
Details
Article 1st page
