The 63rd JSAP Spring Meeting 2016
Session ID : 20p-S221-13
Conference information
Host: The Japan Society of Applied Physics
Name : JSAP Spring Meeting
Number : 63
Location : [in Japanese]
Date : March 19, 2016 - March 22, 2016
Consideration for the process dependence of electrical characteristics by the structural analysis of the ferroelectric HfSiO film using FT-IR method
*Yuichi Kamimuta, Shosuke Fujii, Takaishi Riichiro, Ino Tsunehiro, Nakasaki Yasushi, Saitoh Masumi, Koyama Masato
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