JSAP Annual Meetings Extended Abstracts
Online ISSN : 2436-7613
The 78th JSAP Autumn Meeting 2017
Session ID : 5p-S41-13
Conference information

Investigation of Suitable Approximation Order of 2-variable Function of Exposure Conditions for Half-pitch 50 nm Line-and-space Pattern Formed by Electron-beam Lithography
*Masahito KurouchiManabu YasuiSatoru Kaneko
Author information
CONFERENCE PROCEEDINGS FREE ACCESS

Details
Article 1st page
Content from these authors
© 2017 The Japan Society of Applied Physics
Previous article Next article
feedback
Top