The 80th JSAP Autumn Meeting 2019
Session ID : 20p-N304-9
Conference information
Host: The Japan Society of Applied Physics
Name : JSAP Autumn Meeting
Number : 80
Location : [in Japanese]
Date : September 18, 2019 - September 21, 2019
In-situ etching reaction analysis of silicon nitride in ALE by fluorine radicals
*Kazuya Nakane, Rene H. J. Vervuurt, Takayoshi Tsutsumi, Nobuyoshi Kobayashi, Masaru Hori
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