JSAP Annual Meetings Extended Abstracts
Online ISSN : 2436-7613
The 80th JSAP Autumn Meeting 2019
Session ID : 19p-E313-9
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Dependence of field effect mobility of strained Si/relaxed SiGe/Si(110) p-MOSFET on strained Si layer thickness
*Taisuke FujisawaAstushi OnogawaDaichi NamiuchiShingo SaitoYuichi SanoDaisuke IzumiJunji YamanakaKosuke HaraKentaro SawanoKiyokazu NakagawaKeisuke Arimoto
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© 2019 The Japan Society of Applied Physics
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