The 81st JSAP Autumn Meeting 2020
Session ID : 11a-Z03-4
Conference information
Host: The Japan Society of Applied Physics
Name : JSAP Autumn Meeting
Number : 81
Location : [in Japanese]
Date : September 08, 2020 - September 11, 2020
Influence of temperature on etch rate of PECVD-SiN films with CF4/H2 plasma
*Shihnan Hsiao, Kazuya Nakane, Takayoshi Tsutsumi, Kenji Ishikawa, Makoto Sekine, Masaru Hori
Author information
Keywords:
11a-Z03-4,
Plasma Electronics English Session,
PECVD SiN film,
substrate temperature,
bonding structure
Details
Article 1st page
