The 81st JSAP Autumn Meeting 2020
Session ID : 10p-Z23-6
Conference information
Host: The Japan Society of Applied Physics
Name : JSAP Autumn Meeting
Number : 81
Location : [in Japanese]
Date : September 08, 2020 - September 11, 2020
Rate and profile optimization of 4H-SiC wafer etching using ClF3 gas
Kenta Irikura, Masaya Hayashi, *Hitoshi Habuka, Yoshinao Takahashi, Tomohisa Kato
Author information
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