JSAP Annual Meetings Extended Abstracts
Online ISSN : 2436-7613
The 82nd JSAP Autumn Meeting 2021
Session ID : 10p-S202-14
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SiC CVD reactor cleaning using low concentration ClF3 gas
Takumi Mamyouda*Yuika TakizawaHitoshi HabukaAkio IshiguroShigeaki IshiiYoshiaki DaigoHideki ItoIchiro MizushimaYoshinao Takahashi
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© 2021 The Japan Society of Applied Physics
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