Journal of Advanced Science
Online ISSN : 1881-3917
Print ISSN : 0915-5651
ISSN-L : 0915-5651
Paper
Structural analysis of cobalt containing amorphous hydrogenate carbon film
Takanori TAKENOHiroyuki MIKIYutaro HOSOIToshiyuki TAKAGITakeshi SATOAlexeo BOZHKO
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2006 年 18 巻 1+2 号 p. 78-81

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Structure and electrical properties of cobalt-containing amorphous hydrogened carbon films were investigated. Cobalt doped films were prepared by RF discharge of methane gas and DC co-sputtering of the cobalt target. The structure of the films was examined by transmission electron microscope (TEM) and Raman spectroscopy. Cobalt atoms form the grain and they are well dispersed in carbon matrix. The results of Raman spectroscopy show the structure of the carbon is amorphous. But the spectra of the samples after the heat treatment shows different. D peak position was shifted toward the lower frequency and this indicated the change of carbon chemical bonding state. Room temperature resitance and temperature dependence on resistance were also investigated. Resistance at room temperature decreases drastically with increase of metal concentration. Temperature dependence on resistance with the concentration variation of the samples indicate , that electrical properties of the samples with strongly effected by the concentration of embedded cobalt.

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© 2006 Society of Advanced Science
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