抄録
In conventional approach, nitriding of aluminum or aluminum powder compact is nearly impossible because of surface Al2O3 film. Plasma nitriding is a candidate approach to eliminate Al2O3 film and fabricate AlN as a clean technology. Bulk Mechanical alloying (BMA) is applied to Al-1mass%Ti alloy to produce homogeneously distributed fine Ti paticles in refined microstructure Al matrix. In this research, plasma nitriding was employed to cast, cold press and BMA materials. GIXD, EDS and XPS analysis show the formation of AlN on the top surface of nitrified sample co-existing with Al2O3. SEM show the surface microstructure of the nitrified sample with the effect of sputtering along gram boundary in the function of the holding time. The mechanism of AlN formation is proposed for deposition and direct reaction.
