Influence of Ar ion etching on superconducting transition temperature of Bi oxide

Kageyoshi Sakamoto; Tetsuji Tanihira; Noriyuki Inoue; Etsuko Kondoh; Keisuke Itoh; Toshio Shima; Yoshitake Nishi

doi:10.2978/jsas.5.c20

Kageyoshi Sakamoto, Tetsuji Tanihira, Noriyuki Inoue, Etsuko Kondoh, Keisuke Itoh, Toshio Shima, Yoshitake Nishi

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Keywords: High-T_c superconductor, Bi oxide, Ar ion etching

JOURNAL FREE ACCESS

1993 Volume 5 Issue 1 Pages c20-c21

DOI https://doi.org/10.2978/jsas.5.c20

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Abstract

It is a serious problem that excess argon-ion etching greatly deceases T_c*, Thus, the influence of the etching on T_c* is investigated for high-T_c Bi oxide, A critical etching time (t_e^c) to maintain high T_c above 100K is defined and obtained. The t_e^c is 8.5ks for the argon-ion etching.

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