Abstract
In liquid crystal display panel production, the silica glass photo mask in the photolithography process is becoming larger, and planarity improvement of the silica glass photo mask is required. Planarization of the mask surface requires polishing. However, the polishing of large-sized silica glass involves nonuniform slurry flow under the glass. In this study, we visualized the slurry flow in polishing of a square of silica glass to realize uniform slurry flow. Furthermore, we visualized the slurry flow with various grooved polishing pads and examined the slurry flow between the silica glass and pad surface.
