Abstract
A new nonlinear film resistance model and a new nonlinear film growth model in electrodeposition (ED) coating simulation are presented. The new resistance model considers the electric resistance of turbid paint on cathode before the film deposition. The new growth model considers history dependency in the film growth rate varied with current density on cathode when the initial film deposits. The parameters of the new models are identified with a series of simple one-plate ED test data. Some finite element analyses show that the results with the new models are more accurate compared to those with the conventional models.
