Recently, the industrial applications of electron-beam melting, such as welding, evaporation, cutting of thin film resistor and working of semi-conductor, have developed rapidly.
But electron-beam machines have complex structure, and it is considerably difficult to operate.
The authors designed the simple electron-beam machine for trial, and worked semi-conductors.
The experimental results and discussions are as follows;
1) Cracks of high melting point materials by D. C electron-beam compared with pulsed beams: the former is bigger about twice or three times than the latter, and shows about twice in depth.
2) By electron-beam bombardment to N-type Ge single crystals are formed miniature recrystallizations.
And this part of recrystallization converted N-type to P-type.
The authors studied electrical characteristics of them.
3) By electron-beam welding alloyed In with N-type Ge, and observed V-I characteristics of P-N junction.
4) As application of electron-beam spot welding, made InSb alloy on N-type Ge single crystal by way of experiment, and obtained the growth of tiny InSb crystals like small branch.
