セラミックスのレーザ誘起熱化学反応加工

抄録

CO₂ laser-induced thermo-chemical etching characteristics of ZrO₂ and Al₂O₃ ceramics in halogen-containing gas (CF₄, C₃F₈, CF₃CF=CF₂, C₂H₄F₂) were investigated experimentally. Effects of laser power, laser irradiation time, etching gas, gas pressure, gas flow rate and laser scan speed on ethed depth, ethed region (etched hole diameter or etched groove width), thermal affected region and etched surface roughness were estimated. Following results were obtained. The etching characteristics are highly influenced by etching gas dissociation energy, gas pressure and laser absorptivity of etching gas. With appropriate etching condition, it is possible to drill, groove, cut and surface finish without forming thermal affected layer. In case of surface finishing, repetitive laser scanning with low power laser and high scan speed have a good effect on etched depth and surface roughness.