抄録
A new high pressure apparatus with cubic anvil device has been developed to carry out simultaneously X-ray diffraction and electrical resistance measurement up to 10 GPa at low temperature down to 7 K. This apparatus consists mainly of a uniaxial press for pressure generation, an X-ray diffraction system with an energy dispersive detector, and a cryostat. Some experimental results of the simultaneous measurements obtained by using this apparatus are also reported.
