抄録
A moving-mask exposure apparatus that allows backside exposure through transparent substrate to form the mold of microneedle patch with thick photoresist was developed. By choosing moving trajectory, various shape microneedle can be produced from a single mask pattern. The photoresist microneedle pattern was replicated by poly-dimethylsiloxane (PDMS). The mixture of chondroitin sulfate C and sterilized water was poured over the PDMS mold. Finally, the cured chondroitin sulfate C microneedle patch was detached from the PDMS mold. From scanning microscope observation, successful shape transfer form the photoresist MN to the chondroitin sulfate C microneedle was confirmed.
