Film Thickness in Gas-Liquid Two-Phase Flow : 4fh Report, Film Thinning Mechanism During the Drainage

抄録

In a gas-liquid two-phase upward flow system with a flow obstacle, it has been reported in previous papers, the water film thickness below the obstacle is extremely reduced due to a drainage, which is caused by the prevention of a reverse flow of water film surrounding a gas slug. This paper presents an experimental and analytical approach to understand the film thinning mechanism during the drainage. A physical background for the formation of the minimum film thickness is also provided, and the film thinning effect due to drainage is suggested to be principal cause producing dry patch under diabatic condition.