ASMP : proceedings of Asian Symposium on Materials and Processing
Online ISSN : 2424-2853
セッションID: B-12
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B-12 Rapid Growth of Diamond-like Carbon Films by Nanopulse Magnetron Chemical Vapor Deposition(Session: Coatings/Thin Films)
Masanori SaitoTakao SaitoYoshimasa KondoHiroya MurakamiNaoto Ohtake
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Growth rate of DLC films were investigated using magnetic field enhanced nanopulse plasma chemical vapor deposition method. Maximum growth rate of DLC film by this magnetron CVD method is approximately fifty-fold larger than that of conventional plasma CVD method. High growth rate area of DLC film corresponds to the magnetic field distribution region that the field is parallel to the substrate 15 to 20 mm above the substrate.
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© 2006 一般社団法人 日本機械学会
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