Development of Stress Analysis for LSI Lithography Mask Using Multi-scale Analysis

The Proceedings of The Computational Mechanics Conference

Online ISSN : 2424-2799

2003.16

DOI https://doi.org/10.1299/jsmecmd.2003.16.613

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Development of Stress Analysis for LSI Lithography Mask Using Multi-scale Analysis

Junji SAWAMURA, Katsuyuki SUZUKI, Hideomi OHTSUBO

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Keywords: Multi-scale analysis, LSI Lithography, Equivalence stiffness matrix

CONFERENCE PROCEEDINGS FREE ACCESS

Pages 613-614

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© 2003 The Japan Society of Mechanical Engineers

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