The Proceedings of the Fluids engineering conference
Online ISSN : 2424-2896
2001
Session ID : 107
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107 Effects of the substrate bias on a silicon etching in a chlorine plasma
Hiroshi SASAKI, Kenichi NANBU, Masayoshi TAKAHASHI, Takatsugu EDO
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Keywords: ICP reactor, Plasma processing, Duty ratio
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© 2001 The Japan Society of Mechanical Engineers
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