茨城講演会講演論文集
Online ISSN : 2424-2683
ISSN-L : 2424-2683
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109 銅電解メッキ膜のナノインデンテーション試験
佐々木 涼檜山 菜月金成 守康
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p. 17-18

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The mechanical properties of a Copper electroplating film and Copper bulk material are measured using a Nanoindentation test. This lating film was an amorphous substance (amorphous) after it left it for 24 hours or more in the room temperature, and it became a result by Koike et al. and a different result. The hardness of the copper plating film has lowered overall by about 20% compared with the bulk material. It is thought that hardness lowered to the hardness of the copper plating film overall because hardness including this pore.

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