抄録
The novel method of filling complex micromold inserts for both positive and negative structures, i.e. high-aspect-ratio micropillar and deep microcavities are presented. Hollow microneedle array is the target prototype of such a complex replication. The mold features employed in this work are; an array of SU-8 pillars formed on a slope of silicon cavities and two-part insert of silicon cavity array aligned with comb structures. The cavities are fabricated using a combination technique of anisotropic wet etching and deep reactive ion etching. Megasonic agitation is applied during polymer casting into the mold inserts to resize the micro air-bubbles until disappeared.