Abstract
This paper presents an investigation of the influence of the photocatalysis of TiO_2 films on Si-wefer substrates using Unbalanced Magnetron Sputtering. The effect of the pulsed power supply and the working temperature on the deposition rate, the resulting photocatalytic properties and the crystallinity, the surface morophology was investigated. The films were characterized by scanning electron microscope, scanning probe microscope and X-ray diffraction. The photocatalytic performance was evaluated by the measurement of the decomposition of methylene blue under UV irradiation. The results of photocatalytic performance showed that the photocatalytic performance is improved by the pulsed power supply. In addition, The results of SPM showed that the TiO2 films becomes smoothed by increasing the work temperature
