Abstract
Sapphire is used as a growth substrate of GaN for blue LEDs. It’s necessary for the substrate to obtain a smooth surface by CMP polishing, however it takes a lot of time and cost to create a mirror surface without damage, because sapphire is high hardness and has chemical stability. In this study, a newly mechano chemical composite abrasive (MeCCA) was developed for polishing of sapphire C face. We investigated polishing characteristics of MeCCA and the possibility of a grindstone with MeCCA as a component.