茨城講演会講演論文集
Online ISSN : 2424-2683
ISSN-L : 2424-2683
セッションID: 711
会議情報

金属含有多孔質定盤の研磨効果の検討
*寒河江 泰崇豊澤 功太郎林 偉民鹿野 達也俵 義宣
著者情報
会議録・要旨集 認証あり

詳細
抄録

In recent years, demand for sapphire substrate is expected. Sapphire has characteristics of high hardness, high strength, high heat resistance, high corrosion resistance and high permeability, and therefore it is applied to various machines. Copper and tin platens are used for polishing of sapphire substrates. However, sapphire is said to be poorly processed due to difficult processing materials. Therefore, we will conduct a material characteristic and polishing characteristic of sapphire substrate using a copper platen currently used for processing and a newly developed metal containing porous platen, and compare and investigate the polishing characteristics.

著者関連情報
© 2018 一般社団法人 日本機械学会
前の記事 次の記事
feedback
Top