IIP情報・知能・精密機器部門講演会講演論文集
Online ISSN : 2424-3140
会議情報
108 自由分子流領域の分子気体潤滑方程式とその基本性質 : 適応係数の影響
嶋田 英和山岸 大悟山根 清美松岡 広成福井 茂寿
著者情報
会議録・要旨集 フリー

p. 55-58

詳細
抄録
For examining molecular gas film lubrication (MGL) characteristics in several nanometers, free molecular MGL equation, which employs Poiseuille flow rate and shear stress coefficient for free molecular flow region, is established considering surface accommodation effects and calculated the characteristics of plane inclined slider and step slider with accommodation coefficients of disk and slider, α_0 and α_1,as parameters. As the minimum spacing decreases, pressures and shear stresses by the use of conventional MGL equation and the free molecular MGL equation become close each other, which means free molecular MGL equation is applicable for the nanometer region. Moreover, differences among any flow rates in Poiseuille flows become diminished, as the minimum spacings decreases and bearing number increases.
著者関連情報
© 2002 一般社団法人 日本機械学会
前の記事 次の記事
feedback
Top