The Proceedings of the Conference on Information, Intelligence and Precision Equipment : IIP
Online ISSN : 2424-3140
2005
Session ID : 2201
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2201 Process Parameters Determination with Numerical Approach on Double Exposure Deep X-ray Lithography
Yoshikazu HiraiNaoki MatsuzukaOsamu Tabata
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Abstract
This paper presents a new analytical method to determine process parameters on Double exposure Deep X-Ray Lithography (D^2XRL). D^2XRL is a unique and promising technique for 3D micro fabrication among other techniques. As an example, it was demonstrated that a micro-needle array with the very sharp tip is easily and successfully fabricated without any special apparatuses and difficult process control. The advantage of the newly proposed analytical method is that an effective relationship between required shape and process parameters are derived directly from equations. It was successfully demonstrated that the process parameters to fabricate a micro-needle with specific "height" and "tip angle" was possible to be determined by proposed analytical method.
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© 2005 The Japan Society of Mechanical Engineers
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