Abstract
We studied a new fabrication process for a micro mirror array device with piezoelectric unimorph actuators and simulated its actuation. In this fabrication process, piezoelectric thin film (PZT ; Pb(Zr,Ti)O_3) is deposited on SOI substrate by sputtering after actuator parts are released by BHF wet etching. Therefore, patterning or etching piezoelectric layer is not necessary, which means that proposed fabrication process can apply to various piezoelectric devices. Furthermore, we confirmed the actuation of proposed micro mirrors by FEM simulation.
