抄録
Nanoimprint is a technique to fabricate nanoscale patterns by pressing a mold onto a resin material. In particular, nanoimprint lithography (NIL) using UV curable photoresist is expected to improve a process of semiconductor memory manufacturing in the future. During molding, the photoresist is confined in nanometer-sized gaps (nano-gaps) between the mold and the substrate. Furthermore, in the NIL of the semiconductor memory manufacturing process, high precision positioning of the mold is indispensable, and the photoresist is sheared at the nano-gap. The frictional resistance at this time becomes a factor of lowering the positioning accuracy. Therefore, prediction and control of frictional resistance are essential to improve positioning accuracy. However, it is known that various liquids have characteristic mechanical properties in nano-gaps. In this study, we aimed to elucidate the viscoelasticity of photoresist for UV nanoimprint confined and sheared in the nano-gap by the highly accurate nanorheological measurement method developed in our previous study.
