関西支部講演会講演論文集
Online ISSN : 2424-2756
セッションID: 413
会議情報
413 Tersoffポテンシャル,TB法,第一原理計算によるシリコンき裂先端場の解析(GS-1 分子動力学法)
釘宮 哲也渋谷 陽二Peter Gumbsch
著者情報
会議録・要旨集 フリー

詳細
抄録
Crack-tip field of silicon is analyzed using the molecular dynamics simulation with the empirical Tersoff potential and Tight-binding (TB) method with environment-dependent TB potential. As a result of using the Tersoff potential, the crack-tip tends to round due to its cut-off function. TB calculations show that the anisotropic bond breaking process at the crack-tip is obtained, which is in good agreement with the ab-initio results. It is found that the surface reconstruction on the crack wake plays an important role on this anisotropy.
著者関連情報
© 2001 一般社団法人 日本機械学会
前の記事 次の記事
feedback
Top