OS0109 Behavior of droplet on Si wafer with rotational acceleration

Abstract

Droplet behavior with rotational acceleration was experimentally investigated. The experiments were carried out using hydrophilic (Type-A) and hydrophobic (Type-B) wafers as the test pieces. Deformation and movement of droplet on wafer by rotational acceleration were visualized by a video camera. Characteristics of droplet migration were evaluated. Two types of droplet migration patterns were observed. The droplet on TypeA was deformed in the direction of acceleration, and the elongation with trace leaving on the wafer was observed. On the other hand, droplet on TypeB was moved without large deformation. This characteristic observed on the occasion of migration.