The Proceedings of Conference of Kanto Branch
Online ISSN : 2424-2691
ISSN-L : 2424-2691
2021.27
Session ID : 10A02
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Study on Visualization of Cleaning Phenomena in Nano-scale by Evanescent Field
(Particle Removal and Re-adhesion Characteristics on Scrubbing)
*Panart KHAJORNRUNGRUANGYutaka TERAYAMAKeisuke SUZUKIHaruki UTSUMISatomi HAMADAYutaka WADAHirokuni HIYAMA
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Abstract

Cleaning phenomena in semiconductor manufacturing is about the nanoparticles being removed out from, or re-adhering to, or returning to the wafer surface. However, these residual nanoparticles from polishing slurry on the wafer are usually inspected before-and-after cleaning process, not during the wet cleaning process. Accordingly, these cleaning phenomena mechanism on the surface have already not clearly known. Therefore, we have been establishing dynamically visualization of wet cleaning phenomena on the surface applying localized light called evanescent light that is generated by an optically internal reflection. This report introduces some of observed physical characteristical phenomena during duplicated scrub cleaning process of 10 and 30 nm gold particles by PVA brushes without and with skin layer, which have different contact area ratio on the surface being cleaned.

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© 2021 The Japan Society of Mechanical Engineers
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