Abstract
With recent advances in miniaturization technologies of electronic parts, the thinning technique of IC chips has also become important. In this study, a fine abrasive grinding wheel, called EPD pellet, was fabricated and a silicon wafer was ground with constant pressure machining. Constant pressure grinding with silica EPD pellets made a mirror surface about 3.4 nm Ra on the silicon wafers. The highest grinding efficiency was about 2.0,twice as much as case of ordinary constant infeed grinding.