Proceedings of International Conference on Leading Edge Manufacturing in 21st century : LEM21
Online ISSN : 2424-3086
ISSN-L : 2424-3086
2007.4
Session ID : 7B204
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PCD Dressers for Chemical Mechanical Planarization with Uniform Polishing
*Hiroshi ISHIZUKAMarehito AOKIJames C. SUNGMichael SUNG
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Abstract

Instead of attaching individual diamond grits to a metal substrate as all pad conditioners are made today, a revolutionary design by carving the structure out of a strong polycrystalline diamond (PCD) matrix. Such Advanced Diamond Disks (ADD) are manufactured by electro discharge machining (EDM) of PCD to form cutting pyramids of a specific size with a designed shape. ADD can produce a much higher density of pad asperities for polishing wafers at high efficiency and with high uniformity. This is a paradigm shift that low pressure CMP is not necessary to avoid damaging of delicate copper circuitry supported by ultra low dielectric constant material.

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© 2007 The Japan Society of Mechanical Engineers
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