A29 Ion-bombardment-enhanced etching of quartz(M4 processes and micro-manufacturing for science)

Abstract

Mask-free and rapid patterning of fused quartz surface is useful for various applications, such as rapid prototyping of optical elements and UV nanoimprint molds. We examined the fabrication of patterned quartz for such applications by ion-bombardment-enhanced etching using buffered hydrofluoric acid as the etching solution.