Abstract
We developed the new x-ray exposure system using synchrotron radiation (SR) at New SUBARU of laboratory of advanced science and technology for industry (LASTI), University of Hyogo. The new beamline consists from two-stacked beamlines with the different x-ray source energies; one is for the high energies (high energy beamline) from 3 to 15 keV and the another beamline is for the low energies (low energy beamline) from 100 eV to 3 keV. The apparatus has been designed for the fabrication of microstructures with the wider size range from submicron to milimeter at wider fabrication area of A4 size. In this paper the outline of the new LIGA x-ray lithography system and the quality of the fabricated microstructure are described.
