抄録
In order to gain insights into the mechanism of PVA brush cleaning in semiconductor device fabrication, we measure the coefficient of friction (COF) between PVA brush and substrates. To obtain the coefficient of friction, the share and normal forces caused by horizontal brush movements are independently measured using load cell and brush traverse apparatus. As a result, the COF values decrease with increasing the brush traverse speed and increase with the brush compression. This result implies that the brush and surface are directly contacted condition and the real contact area of the brush increases over the contact time.
