J0320501 自己組織化を利用した高分子多孔質構造の作製とその応用([J032-05]ポリマー・セラミックス・メタル多孔質材料の開発と応用(5),材料力学部門)

抄録

In this report, we show the preparation of self-organized honeycomb-patterned porous polymer films and their applications for superhydrophobic surface and etching masks. The preparation method of honeycomb-patterned porous polymer films was easy and simple; casting a hydrophobic polymer solution containing hydrophobic polymer and surfactant on a solid substrate under humid condition. After several minutes, honeycomb-patterned porous polymer films were formed by using condensed water droplet arrays as template. Honeycomb-patterned films are consisted of three parts: top porous layer, bottom dimpled layer and pillar structures. Because of these pillar structures are mechanically weak, we can divide honeycomb-patterned films into top porous layer and bottom dimpled layer by using adhesive. The dimpled bottom layer, pincushion films, shows superhydrophobicity, and top porous layer can be used as etching masks. By using top porous layer as wet etching masks, dimpled iron surface can be obtained. Top porous layer also can be used as dry etching masks, and the silicon nanospike-array structure, which was reflected 3-dimensional structures of top porous layer, was formed. These surfaces have functions of anti-seizure property and superhydrophobicity, respectively. Detail preparation methods and functions will be discussed.